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Applied Materials Centura 5200 (S/N: C045)

  • 200mm wafer size
  • Number of chambers: 3
  • Process capability: CVM/Anneal and PVD
  • Chamber 1: CVD with liquid delivery system and vaporizer
  • Chamber 2: PVD
  • Chamber 3: MAC Anneal
  • Controller type: VME
  • Reduced Pressure: Yes
  • External cooling: Water cooled
  • Accessories:
    • Degas Chamber
    • Orientor chamber
    • Heat exchanger (two)
    • MAC Blower
    • RF Generator Rack
    • Cryo compressor (two)
    • System cables
    • Monitors (two)
  • Process Gases: N2, O2, Ar, N20, H2/N2, and NH3
  • CVD ampoules include: Octane and 2 proprietary precursors
  • Vintage: 1994