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Axelis/Eaton GSD200E (S/N: 327)

  • NV-GSD200E 180KEV high current implanter
  • NVGSD200 source and accelerator system
  • Enhanced bernas source w/ dual vaporizers
  • Bypass values and Nitrogen purge
  • Variable aperture extraction electrode
  • Enhanced low energy beamline
  • 80Kv single stage extraction
  • Triple indexed mass analysis magnet and p/s
  • 80kv post acceleration electrode assy. (180Kv system only)
  • NVGSD200 end station four cassette capacity
  • Automatic notch alignment capability with buffer cassette
  • Integrated dummy wafer fill-in capacity
  • In-Air, In-Vacuum high throughput wafer handling area
  • Real time patented dose control
  • Real time beam profiler
  • High Vac pump
  • Source roughing pump
  • End station Cryo pump
  • Beamline cryo pump
  • End station roughing pump
  • Vintage Jan 1997