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Varian EHP500 Medium Current Implanter

  • Vintage 2001
  • Currently configured for 4 wafer
  • Rotating, uncooled platen with silicon-coated 6 point clamp
  • 225 wafer capacity highly polished load locks
  • Tungsten Bernas Ion source
  • HP gas box
  • Inert (Ar) connection
  • 2 stage low beam aperture
  • Ion beam filter
  • End station pumping: 2 varian 300HT loadlock turbo, 1 CT-10 chamber Cryo
  • Metals reduction kit
  • Si-coated acceleration colum
  • Graphite target chamber side wall shields
  • Resolving chamber cold cathode vacuum gauge
  • SECSII host communications
  • V11 s/w, real time beam, purity check s/w.